362.084 Semiconductor Technology Labcourse
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2021S, UE, 2.0h, 3.0EC

Properties

  • Semester hours: 2.0
  • Credits: 3.0
  • Type: UE Exercise
  • Format: Hybrid

Learning outcomes

After successful completion of the course, students are able to...

.... to independently combine the process of microfabrication for fabrication of simple devices
... to apply the basic processes of manufacturing integrated circuits or MEMS components.

... to select the appropriate analysis methods (e.g. atomic force microscopy or scanning electron microscopy) to solve the problem

The knowledge acquired can usually be deepened in a longer project work 362.092.


 

 

 

Subject of course

Laboratory work on structuring and characterization techniques in semiconductor manufacturing

Work program of the Group WEBER : 

Electrical charactarization of Ge-Nanostructures-Details on request


Work program of the Group LUGSTEIN : on request

 

Work program of the group WANZENBOECK

Processing techniques of research-related areas (optional): 
x) optical lithography and PVD metal deposition for cell culture microchip * 
x) direct writing of metal structures (Local CVD with a focused electron beam) * 
x) Topographic (AFM) and chemical (EDX) characterization of nanostructures * 
x) Electrical characterization of microstructures (eg from Elekronenstrahlinduzierter deposition.) 
x) other topics available on request

 

Teaching methods

Basic practical knowledge in semiconductor technology 

Duration: 3-day internship (other times available on request) 
Start: by individual appointment (also possible during the holidays) 
Group: max. 3 students 

Grade: based on a laboratory report

 

 

Mode of examination

Oral

Additional information

LVA is carried out in 3 groups.
There are several courses offered by appointment during the semester.

Registration required (preferably in groups of 2-3 students) by email to 

to             alois.lugstein@tuwien.ac.at

or          heinz.wanzenboeck@tuwien.ac.at    

or          masiar.sistani@tuwien.ac.at 

 

New in summer term 2018;
TISS registration for courses by Prof. Wanzenboeck required!
Course content: optical lithography, sputter deposition, dry etching
Basic knowledge of processing technology is a precondition.
please register by TISS
Attention: course dates may change in case of unexpected events.


Lecturers

Institute

Examination modalities

Lab report

Course registration

Begin End Deregistration end
05.03.2021 06:00 28.06.2021 22:00 04.07.2021 22:00

Registration modalities

Registration for this course (ideally as groupe) per email to:

alois.lugstein@tuwien.ac.at             or 

heinz.wanzenboeck@tuwien.ac.at

Registration email with Header "Anmeldung 362.084 Labor Mikroelektronik"
+ you names, your student IDs, suggesteed start dafe

Curricula

Study CodeObligationSemesterPrecon.Info
066 434 Materials Sciences Not specified
066 439 Microelectronics Not specified3. Semester
066 460 Physical Energy and Measurement Engineering Mandatory elective
066 504 Master programme Embedded Systems Not specified
066 508 Microelectronics and Photonics Not specified

Literature

No lecture notes are available.

Previous knowledge

Recommended in combination with
362.144  VO Prozesstechnologien der Mikroelektronik, Photonik und der Mikrosystemtechnik
362.152 VU Materialien, Prozesse und Technologien der Mikroelektronik
362.146 VU Prozesschemie für Mikro- und Nanoelektronik

Preceding courses

Accompanying courses

Continuative courses

Miscellaneous

  • Attendance Required!

Language

if required in English