362.060 Labcourse on silicon technology
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2021S, PR, 8.0h, 8.0EC

Properties

  • Semester hours: 8.0
  • Credits: 8.0
  • Type: PR Project
  • Format: Distance Learning

Learning outcomes

After successful completion of the course, students are able to summarise various Si-processing techniques, to work under clean room conditions, to use media and equipments for Si-technology, to categorise materials of semiconductor technology, to characterise electronic components on the level of chip and wafers as well as to apply the acquired knowledge on a laboratory work.

 

Subject of course

Various Si-processing techniques like focussed ion beam techniques, CVD etc. 

 

 

Teaching methods

Introduction to Si-technology; Working under clean room conditions; Briefing to media and equipments of Si-technology

 

Mode of examination

Oral

Additional information

Aufwendiges Labor / parallel mit Assistenten

Lecturers

Institute

Examination modalities

Grading is based on the laboratory work and the corresponding report

 

Course registration

Begin End Deregistration end
04.03.2021 06:00 03.07.2021 23:00 03.07.2021 23:00

Registration modalities

 Please contact the lecturers per email!

Please register via TISS

Lab will be at: TUWien Nano-Center (Building CH)

 

Curricula

Literature

Stanley Wolf, Silicon Processing for the VLSI Era, Vol. I, Process Technology, 1990, Lattice Sunset Beach, Ca, ISBN 0-961672-4-5 Stanley Wolf, Silicon Processing for the VLSI era, Vol. II, Process Integration, 1986, Lattice Sunset Beach, Ca, ISBN 0-961672-3-7 S.M. Sze, VLSI Technology, 1993, Mc Graw Hill Book D. Widmann, H. Mader, H. Friedrich, Technologie hochintegrierter Schaltungen, 1996, Springer

Miscellaneous

  • Attendance Required!

Language

German