After successful completion of the course, students are able to summarise various Si-processing techniques, to work under clean room conditions, to use media and equipments for Si-technology, to categorise materials of semiconductor technology, to characterise electronic components on the level of chip and wafers as well as to apply the acquired knowledge on a laboratory work.
Various Si-processing techniques like focussed ion beam techniques, CVD etc.
Introduction to Si-technology; Working under clean room conditions; Briefing to media and equipments of Si-technology
Aufwendiges Labor / parallel mit Assistenten
Grading is based on the laboratory work and the corresponding report
Please contact the lecturers per email!
Please register via TISS
Lab will be at: TUWien Nano-Center (Building CH)